AIChE J, 2014, 60, 3614: Atomic Layer Deposition of Polyimide on Microporous Polyethersulfone Membranes for Enhanced and Tunable Performances
作者：Ting Sheng, He Chen, Sen Xiong, Xiaoqiang Chen, Yong Wang*
關(guān)鍵字：Atomic Layer Deposition, Polyimide, Polyethersulfone, Membranes
論文來源：期刊
發(fā)表時(shí)間：2014年
Atomic
layer deposition (ALD) of polyimide (PI) is explored to tune the separation
properties of microporous polyethersulfone (PES) membranes and also to improve
their mechanic and thermal stability. Conformal and uniform thin layers of PI
are deposited along the pore wall throughout the entire PES membrane instead of
forming a top layer merely on the membrane surface. With increasing ALD cycles,
the pore size of the PES membrane is progressively reduced, leading to increased
retention. The permeation is correspondingly decreased but its drop is less
pronounced than the increase of retention. For example, the retention to 23-nm
silica nanospheres is significantly increased from nearly zero to 60 % after 3000
ALD cycles while the water flux is moderately decreased by 54 %. Moreover, ALD of
PI evidently enhances the mechanical strength and thermal resistance of the PES
membrane as PI tightly wraps the skeleton of the membrane.