Hui Zhao, Jingfeng Wang, Mukun He, Shuai Li, Hua Guo, Dongxiao Kan, Hua Qiu, Lixin Chen* and Junwei Gu*. Electromagnetic Interference Shielding Films: Structure Design and Prospects. Small Methods, 2024, DOI: 10.1002/smtd.202401324. 2023IF=10.7.
https://onlinelibrary.wiley.com/doi/10.1002/smtd.202401324
Abstract
The popularity of portable and wearable flexible electronic devices, coupled with the rapid advancements in military field, requires electromagnetic interference (EMI) shielding materials with lightweight, thin, and flexible characteristics, which are incomparable for traditional EMI shielding materials. The film materials can fulfill the above requirements, making them among the most promising EMI shielding materials for next-generation electronic devices. Meticulously controlling structure of composite film materials while optimizing the electromagnetic parameters of the constructed components can effectively dissipate and transform electromagnetic wave energy. Herein, the review systematically outlines high-performance EMI shielding composite films through structural design strategies, including homogeneous structure, layered structure, and porous structure. The attenuation mechanism of EMI shielding materials and the evaluation (Schelkunoff theory and calculation theory) of EMI shielding performance are introduced in detail. Moreover, the effect of structure attributes and electromagnetic properties of composite films on the EMI shielding performance is analyzed, while summarizing design criteria and elucidating the relevant EMI shielding mechanism. Finally, the future challenges and potential application prospects of EMI shielding composite films are prospected. This review provides crucial guidance for the construction of advanced EMI shielding films tailored for highly customized and personalized electronic devices in the future.
便攜式、可穿戴柔性電子設備的普及以及軍事領域的快速發展，對電磁屏蔽材料提出了輕質、薄型、柔性等特性要求，這是傳統電磁屏蔽材料無法比擬的。而薄膜材料能夠兼顧上述要求，已經成為下一代電子設備最有前途的電磁屏蔽材料之一。在精細調控薄膜材料結構的同時，優化組構的電磁參數，可有效地耗散和轉化電磁波能量。因此，從結構設計出發，本綜述系統地概述了高性能電磁屏蔽復合薄膜的研究進展，包括均勻結構、層狀結構、多孔結構等。詳細介紹了電磁屏蔽材料的衰減機理和電磁屏蔽性能的評價方法（Schelkunoff理論和計算理論），重點分析了復合薄膜的結構特性和電磁參數對電磁屏蔽性能的影響規律，同時，總結了電磁屏蔽復合薄膜的設計準則，并闡明了相關的電磁屏蔽機理。最后，展望了電磁屏蔽復合薄膜面臨的挑戰和潛在的應用前景，為未來高度定制化、個性化電子設備所需的先進電磁屏蔽薄膜的構建提供了重要的指導。
第一作者：趙輝
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