【Langmuir】Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes
作者：Men Yonghong; Xiao Peng; Chen Jing; Fu Jun; Huang Youju; Zhang Jiawei; Xie Zhengchao; Wang Wenqin; Chen Tao*
關(guān)鍵字：Controlled Evaporative Self-Assembly
論文來源：期刊
具體來源：Langmuir 2014, 30, 4863?4867
發(fā)表時間：2014年
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining
controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.