[Adv. Mater. Interfaces] Water-Based Photo & Electron-Beam Lithography Using Egg White as a Resist
作者：Bojing Jiang, Jie Yang, Chen Li, Liangliang Zhang, Xu Zhang, Peng Yang
關(guān)鍵字：egg white, resist material, lithography, electron-beam, UV exposure
論文來源：期刊
具體來源：Advanced Materials Interfaces
發(fā)表時(shí)間：2017年
Complex lithographic steps and the use of toxic chemicals in these processes are in conflict with a sustainable human society. Development of new inexpensive and green resist, simple alternative procedures, and non-toxic solvents is the key to move recyclable micro/nano-fabrication from laboratory level to industrial application in large scale. Herein, precise control on protein fragmentation/aggregation upon photo/electron irradiation is conceived into egg white-based green resist for all-water-based photo/electron-lithography at sub-micron resolution. We acquire the egg white simply from chicken egg without additional complex purification steps. Photolithography and electron-beam direct writing on spin-coated egg white layer could generate geometrically complex micro/nano-patterns at a low irradiation dose of 3000 μC/cm2 and 1500 μC/cm2 for effective positive and negative pattern respectively. With further developing the patterned resist in chemical etching system, the resist pattern could be transferred onto underlying Si/SiO2/Au/Cu substrates with good fidelity and one egg could efficiently process five objects with two inches in diameter, demonstrating its practical implication in spatially definable micro/nano-processing of materials.
DOI: 10.1002/admi.201601223 In Press